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Yang Xu - Graphene for Post-Moore Silicon Optoelectronics

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Graphene for Post-Moore Silicon Optoelectronics

Provides timely coverage of an important research area that is highly relevant to advanced detection and control technology

Projecting device performance beyond the scaling limits of Moores law requires technologies based on novel materials and device architecture. Due to its excellent electronic, thermal, and optical properties, graphene has emerged as a scalable, low-cost material with enormous integration possibilities for numerous optoelectronic applications. Graphene for Post-Moore Silicon Optoelectronics presents an up-to-date overview of the fundamentals, applications, challenges, and opportunities of integrating graphene and other 2D materials with silicon (Si) technologies.

With an emphasis on graphene-silicon (Gr/Si) integrated devices in optoelectronics, this valuable resource also addresses emerging applications such as optoelectronic synaptic devices, optical modulators, and infrared image sensors. The book opens with an introduction to graphene for silicon optoelectronics, followed by chapters describing the growth, transfer, and physics of graphene/silicon junctions. Subsequent chapters each focus on a particular Gr/Si application, including high-performance photodetectors, solar energy harvesting devices, and hybrid waveguide devices. The book concludes by offering perspectives on the future challenges and prospects of Gr/Si optoelectronics, including the emergence of wafer-scale systems and neuromorphic optoelectronics.

  • Illustrates the benefits of graphene-based electronics and hybrid device architectures that incorporate existing Si technology
  • Covers all essential aspects of Gr/Si devices, including material synthesis, device fabrication, system integration, and related physics
  • Summarizes current progress and future challenges of wafer-scale 2D-Si integrated optoelectronic devices
  • Explores a wide range of Gr/Si devices, such as synaptic phototransistors, hybrid waveguide modulators, and graphene thermopile image sensors

Graphene for Post-Moore Silicon Optoelectronics is essential reading for materials scientists, electronics engineers, and chemists in both academia and industry working with the next generation of Gr/Si devices.

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Table of Contents List of Tables Chapter 1 Chapter 7 List of - photo 1
Table of Contents
List of Tables
  1. Chapter 1
  2. Chapter 7
List of Illustrations
  1. Chapter 1
  2. Chapter 2
  3. Chapter 3
  4. Chapter 4
  5. Chapter 5
  6. Chapter 6
  7. Chapter 7
  8. Chapter 8
  9. Chapter 9
  10. Chapter 10
Guide
Pages
Graphene for Post-Moore Silicon Optoelectronics

Yang Xu, Khurram Shehzad, Srikrishna Chanakya Bodepudi, Ali Imran, and Bin Yu

Authors Prof Yang Xu Zhejiang University School of MicroNano Electronics - photo 2

Authors

Prof. Yang Xu

Zhejiang University

School of MicroNano Electronics

No. 388, YuHangTang Rd.

Xihu District

310027 Hangzhou

China

Dr. Khurram Shehzad

Zhejiang University

School of MicroNano Electronics

No. 388, YuHangTang Rd.

Xihu District

310027 Hangzhou

China

Dr. Srikrishna Chanakya Bodepudi

Zhejiang University

School of MicroNano Electronics

No. 388, YuHangTang Rd.

Xihu District

310027 Hangzhou

China

Dr. Ali Imran

Zhejiang University

School of MicroNano Electronics

No. 388, YuHangTang Rd.

Xihu District

310027 Hangzhou

China

Prof. Bin Yu

Zhejiang University

School of MicroNano Electronics

No. 388, YuHangTang Rd.

Xihu District

310027 Hangzhou

China

Cover Images: GrAl/Shutterstock

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Library of Congress Card No.: applied for

British Library CataloguinginPublication Data:

A catalogue record for this book is available from the British Library.

Bibliographic information published by the Deutsche Nationalbibliothek

The Deutsche Nationalbibliothek lists this publication in the Deutsche Nationalbibliografie; detailed bibliographic data are available on the Internet at http://dnb.d-nb.de.

2023 WILEYVCH GmbH, Boschstr. 12, 69469 Weinheim, Germany

All rights reserved (including those of translation into other languages). No part of this book may be reproduced in any form by photoprinting, microfilm, or any other means nor transmitted or translated into a machine language without written permission from the publishers. Registered names, trademarks, etc. used in this book, even when not specifically marked as such, are not to be considered unprotected by law.

Print ISBN9783527351817

ePDF ISBN9783527840991

ePub ISBN9783527841004

oBook ISBN9783527841011

Preface

Miniaturization of electronic devices a primary step that drives Moore's law allows the number of digital electronic devices to roughly double by every two years within a fixed cost and area while improving their performance and functionality. However, such progress in powerefficient, highperformance, small device footprint, and lowcost devices has come to a halt as further scaling down leads to difficulty in achieving complex doping profiles and excessive leakage currents. This issue is elevated when devices are scaled down below 3nm, where bulk semiconductors lose their structural quality and show degrading charge transport and optoelectronic properties. In this context, projecting device performance beyond the scaling limits of Moore's law requires technologies based on novel materials, circuits, and device architecture. Graphene and twodimensional ( 2D ) materials have emerged as alternate candidates with atomically thin structures showing excellent charge transport properties and prototypes in computational and noncomputational applications.

Although the domination of Si technology is unlikely to be abandoned in the foreseeable future, the growing benefits of graphenebased electronics call for hybrid device architectures that incorporate existing remarkable technological evolution and commercial success of Si CMOS technology while adopting the novel features of graphene. More than Moore or noncomputational systems, such as photodetectors and modulators for image sensors, light detection and ranging ( LiDAR ), lasers, biomedical sensors, and neuromorphic and radiofrequency devices, are swiftly advancing beyond Si electronics when integrated with graphene and other 2D materials by adapting their benefits of lowpower consumption and intrinsic scalability. Fully integrated prototypes of 2D/Si chips, especially graphene, have been realized for diverse applications, including image sensor arrays and optical receivers. Most of these prototypes are developed on the integrated silicon chips where silicon devices provide driver, source, and readout circuitry. This book discusses the basics, applications, challenges, and opportunities regarding integrating graphene with Si technologies, with a special emphasis on grapheneSi (Gr/Si) optoelectronic devices in the postMoore era.

It might be helpful to summarize the important aspects of Gr/Siintegrated devices in optoelectronics in the postMoore era. Our book also discusses the progress and future challenges from synthesis to device fabrication and related physics of highquality, waferscale Gr/Siintegrated optoelectronic devices. All these aspects of the Gr/Si devices are relevant to a broad research community in chemistry, materials science, and electronic engineering. This book is arranged to discuss the opportunities and challenges of Gr/Si systems, where each chapter emphasizes selected topics such as highperformance photodetectors, energyharvesting devices, and image sensors and their corresponding progress and challenges. Special emphasis is given to emerging applications like optoelectronic synaptic devices, optical modulators, and infrared image sensors. This book will serve as a good reference for graduate students, postdocs, and scientists from academia and industry.

15 July 2022

Prof. Yang Xu,

On behalf of all the authors,

Zhejiang University, Hangzhou, China

Acknowledgments

We would like to thank Ms. Shaoyu Qian and their publishing team from Wiley for their great support. We also would like to sincerely thank the significant and outstanding contributions from our team members including Dr. Lixiang Liu, Dr. Dajian Liu, Dr. Zhixiang Zhang, Dr. P. Pham, Dr. Jianhang Lv, Dr. Dong Pu, Dr. K. Dianey, M. Ali, Xiaocheng Wang, Xiaoxue Cao, A. Anwar, M. Malik, and Xinyu Liu. Without their great support and remarkable dedication, we could not have finished this book. This book is supported by National Natural Science Foundation of China (NSFC) (Grant Nos. 92164106, 61874094, and 62090034).

Biography
Prof Yang Xu is a Fellow of the Institute of Physics FInstP IOP Fellow - photo 3

Prof. Yang Xu is a Fellow of the Institute of Physics (FInstP, IOP Fellow), IEEE NTC Distinguished Lecturer, and IEEE Senior Member of the Electron Devices Society. He received his B.S. degree from Department of EE, Institute of Microelectronics, Tsinghua University, M.S. and Ph.D. degrees in ECE from the University of Illinois UrbanaChampaign (UIUC), USA. He is now a full professor at the School of MicroNano Electronics, Zhejiang University, China. He was also a visiting byFellow of Churchill College at the University of Cambridge, UK, and a visiting professor at the University of California, Los Angeles (UCLA). He has published more than 120 papers in

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