Table of Contents
List of tables
- Tables in Chapter 1
- Tables in Chapter 2
- Tables in Chapter 3
- Tables in Chapter 4
- Tables in Chapter 5
- Tables in Chapter 6
- Tables in Chapter 8
- Tables in Chapter 10
- Tables in Chapter 11
- Tables in Chapter 13
List of illustrations
- Figures in Chapter 1
- Figures in Chapter 2
- Figures in Chapter 3
- Figures in Chapter 4
- Figures in Chapter 5
- Figures in Chapter 6
- Figures in Chapter 7
- Figures in Chapter 8
- Figures in Chapter 9
- Figures in Chapter 10
- Figures in Chapter 11
- Figures in Chapter 12
- Figures in Chapter 13
Landmarks
Table of Contents
Handbook of Thin Film Deposition
Fourth Edition
Edited by
Krishna Seshan
Retired, Intel Corporation, United States
Dominic Schepis
Globalfoundries, East Fishkil, NY, United States
Copyright
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Notices
Knowledge and best practice in this field are constantly changing. As new research and experience broaden our understanding, changes in research methods, professional practices, or medical treatment may become necessary.
Practitioners and researchers must always rely on their own experience and knowledge in evaluating and using any information, methods, compounds, or experiments described herein. In using such information or methods they should be mindful of their own safety and the safety of others, including parties for whom they have a professional responsibility.
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ISBN: 978-0-12-812311-9
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Dedication
We dedicate this book to our families who have supported us and our teachers who have taught us.
To the memory of Dr. Krishna Seshan, accomplished scientist, inspiring editor, good friend, and whose dream made this handbook a reality.
List of Contributors
Takashi Ando , IBM T. J. Watson Research Center, Yorktown, NY, United States
Michael Belyansky , IBM Research, Albany, NY, United States
Elham R. Borujeny , University of Alberta, Edmonton, AB, Canada
Ken Cadien , University of Alberta, Edmonton, AB, Canada
Kenneth C. Cadien , University of Alberta, Edmonton, AB, Canada
Jin Cai , IBM Research, Yorktown, NY, United States
Loren A. Chow , Intel Corporation, Santa Clara, CA, United States
Keith D. Coulson , University of Illinois, Urbana, IL, United States
Robert H. Dennard , IBM Research, Yorktown, NY, United States
Jeff Gambino , ON Semiconductor, Gresham, OR, United States
Dhruv Gelda , University of Illinois, Urbana, IL, United States
S.B. Herner , Glo USA, Inc., Sunnyvale, CA, United States
Arvind Kumar , IBM Research, Yorktown, NY, United States
Angus Macleod , Thin Film Center Inc., Tucson, AZ, United States
Mengmeng Miao , University of Alberta, Edmonton, AB, Canada
Triratna Muneshwar , University of Alberta, Edmonton, AB, Canada
Lucy Nolan , University of Alberta, Edmonton, AB, Canada
Rajan K. Pandey , Globalfoundries, Malta, NY, United States
Manjunath C. Rajagopal , University of Illinois, Urbana, IL, United States
Dominic Schepis , Globalfoundries, Malta, NY, United States
Krishna Seshan
University of Arizona, Tucson, AZ, United States
Intel Corporation, retired
Shahab Siddiqui , Globalfoundries, Malta, NY, United States
Andrew H. Simon , Globalfoundries, Malta, NY, United States
Sanjiv Sinha , University of Illinois, Urbana, IL, United States
Krishna V. Valavala , University of Illinois, Urbana, IL, United States
Deceased
Biographies
Andrew H. Simon
Andrew H. Simon has over 25 years of experience in semiconductor process engineering at IBM and GLOBALFOUNDRIES. He has worked on development of metals sputter deposition processes for copper interconnects since their inception in the industry in the 1990s, and has related interests in interconnect reliability, process integration, and process roadmap definition. His current activities are focused on metals process development for the 7-nm node and beyond. He has coauthored more than 100 US and foreign patents and over 50 publications relating to interconnect metallization. He received a bachelors degree in physics from Princeton University and MS and PhD degrees in physics from the University of Illinois at Urbana-Champaign.
Dr. Gambino
Dr. Gambino received a BS degree in materials science from Cornell University, Ithaca, NY, in 1979, and a PhD degree in materials science from the Massachusetts Institute of Technology, Cambridge, MA, in 1984. He joined IBM, Hopewell Junction, NY, in 1984, where he worked on silicide processes for Bipolar and CMOS devices. In 1992, he joined the DRAM development alliance at IBMs Advanced Semiconductor Technology Center, Hopewell Junction, NY. While there, he developed contact and interconnect processes for 0.25-, 0.175-, and 0.15-m DRAM products. In 1999, he joined IBMs manufacturing organization in Essex Junction, VT, where he worked on copper interconnects, CMOS image sensors, RF devices, and Through-Silicon Via technology. He joined ON Semiconductor, Gresham, OR, in 2015. He is currently working on CMOS image sensors and high-voltage semiconductors. He has published over 100 technical papers and holds over 400 patents.